Objective: To prepare a polishing slurry of α-Al2O3 nanoparticles with good dispersion stability; to improve the chemical mechanical polishing performance of sapphire;

Disperse α-Al2O3 in different dispersing media such as silica sol, cerium oxide sol, water, etc.; prepare a polishing slurry of α-Al2O3 nanoparticles under conditions of different pH, different silica sol concentration and silica sol particle size; The stability of the polishing slurry and the effect of the polishing slurry on the performance of sapphire chemical mechanical polishing; Zeta potentiometer was used to measure the potential of α-Al2O3 in the polishing slurry; the dispersion stability was analyzed; the atomic force microscope (AFM) and The analytical balance evaluates the sapphire surface roughness (Ra) and material removal rate (MRR) respectively;

Results: When the dispersion medium is silica sol; the stability of the polishing slurry and the polishing performance for sapphire is better; when the pH of the polishing slurry is 10; its dispersion stability is better; and the chemical corrosion and mechanical grinding reach a dynamic balance ; The polishing slurry has better polishing performance for sapphire; with the increase of α-Al2O3 concentration; the polishing performance of the slurry first increases and then decreases; when the mass fraction of α-Al2O3 is 10.0%; polishing slurry The polishing performance for sapphire is better; when the mass fraction of silica sol is 0.02%; the dispersion stability of the polishing slurry and the polishing performance for sapphire are better; with the increase of silica sol particle size, the stability of the polishing slurry And the polishing performance of sapphire is gradually getting worse; therefore, silica sol with a particle size of 5nm is selected as the dispersion medium; that is, polishing under the conditions of 10.0% α-Al2O3, 0.02% silica sol with a particle size of 5nm, and pH value of 10 The slurry has good stability; the material removal rate of the slurry for sapphire polishing is 15.16nm/min; the surface roughness after polishing is 0.272nm; it meets the requirements of the subsequent epitaxial process of sapphire; the silica sol of suitable concentration can significantly improve the α- The dispersion stability of Al2O3 polishing slurry; and the polishing performance of sapphire has been significantly improved;

SAT NANO can supply alpha al2o3 nanopowder 50nm, 100nm, 200nm, 500nm used for polishing, if you have any enquiry, please feel free to contact us at admin@satnano.com